&0` @@@ @@@@<pVEpP  EN DB   @ Arranz1996 Atkinson1985 Bagus1991 Behm19888 Behm1992n Bohni1966Bradshaw19799Bradshaw19811 Brundle1991 Brune1988 Brune1992 Cabrera1948 Chen19869 Cooper19822 Crowell1986 Davis1963 Dignam1966 Doherty1963  Ebinger1997  Ebinger1998 Ertl1992n Fawcett1966 Ferrer1985 Frenken1993 Garcia1985Hachicha19811 Hart1956 Hart1970 Hayden1981 Hindam1980 Hofer1988 Hofmann1979 Hofmann1981 Hopkins1962 Hunt1970 Illas1991 J. T. Yates1986  J. T. Yates1997  J. T. Yates1998  Kubaschewski1962  Lawless1974 Maurin1970 Memmert1988 Mott19489 Norton19888O'Connor1993 Ocal1985 Oppermann1981 Palacio1996 Parmigiani1991 Polzonetty1991 Reddy1982 Ritchie1970 Slijkerman1993Smeltzer1980 Smialek1982 Veen19931 Vrijmoeth1993 Wintterlin1988 Wintterlin1992 Wouters1993 Wyrobisch1979 Wyrobisch1981 Zagwijn1993 Zagwijn1993 Zagwijn1993 Zagwijn1993 Zagwijn1993 Zagwijn199393 Zagwijn1993 AuthorsJournalsKeywords   f rv xP A. Arranz C. Palacio 1996d]Characterization of the surface and interface species formed during the oxidation of aluminum Surface Sci. 355 203 A. Atkinson 1985TMTransport processes during the growth of oxide films at elevated temperaturesRev. Mod. Phys.57 437TD>P. S. Bagus C. R. Brundle F. Illas F. Parmigiani G. Polzonetty 1991 XPS study of Al oxidation Phys. Rev. B44 90250)H. Brune J. Wintterlin R. J. Behm G. Ertl 19926/Dissociative chemisorption of oxygen on Al(111)Phys. Rev. Lett.68 624N. Cabrera N. F. Motte 1948Rep. Prog. Rhys.12 1480)J. E. Crowell J. G. Chen J. T. Yates, Jr.e 1986VPInteraction of oxygen with Al(111) - low temperature chemisorption and oxidation Surface Sci. 165n37*#M. J. Dignam W. R. Fawcett H. Bohni{ 19664.inverse logarithmic law for aluminum oxidationJ. Electrochem. Soc. 113e 656  P. E. Doherty R. S. Davis 1963& the growth of thin Al oxide filmJ. Appl. Phys.34 619$H. D. Ebinger J. T. Yates, Jr. 1997B;Electron-impact-induced oxidation of Al(111) in water vapor Phys. Rev. B57 1976$H. D. Ebinger J. T. Yates, Jr. 1998>7Oxidation of Al(111) by electron impact on adsorbed H2O% Surface Sci.412/4131 R. K. Hart 1956@9direct and inverse logarithmic law for aluminum oxidation Proc. R. Soc. A 23668R. K. Hart J. K. Maurini 1970<6The nucleation and growth of oxide islands on aluminum Surface Sci.20 285hRLB. E. Hayden W. Wyrobisch W. Oppermann S. Hachicha P. Hofmann A. M. Bradshaw 1981<5The interaction of oxygen with aluminum: ellipsometry Surface Sci. 109 207"H. M. Hindam W. W. Smeltzer 1980& The growth of thin Al oxide film Oxid. Met.14 337,&P. Hofmann W. Wyrobisch A. M. Bradshaw 1979F?The interaction of oxygen with aluminum single crystal surfaces Surface Sci.80 344G. L. Hunt I. M. Ritchie 197060Al oxide thermal growth at moderate temperatures Oxid. Met.2 361$O. Kubaschewski B. E. Hopkins 1962$Oxidation of metals and alloys London  Butterworths K. R. Lawless 1974The oxidation of metalstRep. Prog. Phys.37 231U. Memmert P. R. Nortone 1988:4Work function measurement on the oxidized Al surface Surface Sci. 203 L689"C. Ocal S. Ferrer N. Garcia) 1985~xCabrera-Mott mechanism for oxidation of metals explains diffusion of mettallic atoms through thin defective oxide layers Surface Sci. 163 3350)K. P. R. Reddy J. L. Smialek A. R. Coopero 1982&O-18 tracer oxidation of NiCrAl Oxid. Met.17 4290*J. Wintterlin H. Brune H. Hofer R. J. Behm 1988*#Oxygen adsorbates on Al(111) by STMn Appl. Phys. Ac4799piE. R. Wouters D. J. O'Connor J. F. van der Veen P. M. Zagwijn J. Vrijmoeth W. Slijkerman J. W. M. Frenken\ 199382The initial stages of the oxidation of Al(111). II Surface Sci. 296 141