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Atomic-layer engineering in complex-oxide systems is a promising
new field in condensed matter physics and materials science. In order
to tackle this problem, we are currently building a unique
oxide molecular-beam-epitaxy (MBE) system that allows precise control
of complex-oxide heterostructures at an atomic scale.
Compared
with the conventional semiconductor and metal MBE's, complex-oxide
MBE has additional technical difficulties. However, our oxide-MBE system
has introduced a number of new features that overcome this hurdle effectively.
Using this capability, we will create various atomic-scale-engineered
oxide materials or “oxide metamaterials”, on which we will investigate
strongly-correlated artificial 2D electron gas, artificial high
Tc superconductors,
magnetism-superconductivity proximity effect, artificial ferroelectrics
and multiferroics, ferroelectric/magnetic tunnel junctions, electric/spin
field effect, and spin-injection Josephson effect.
We
also use other thin-film
growth techniques such as Pulsed Laser Deposition (PLD), Chemical
Vapor Deposition (CVD), Ion Beam Assisted Deposition (IBAD) and
Sputtering for various thin-film devices.
In
parallel with the oxide metamaterials effort, we investigate materials
issues
and decoherence mechanism in superconducting quantum computers. |