Robert E. Vest
Electron & Optical Physics Division
NIST, Gaithersburg, MD
Extreme ultraviolet (EUV) radiation, spanning the electromagnetic spectrum
from about 2 nm (620 eV) to 200 nm (6.2 eV) has long been important in atomic
physics, astronomy, solar physics, and plasma diagnostics. The advent of
EUV lithography, currently scheduled for production in 2009, in the semiconductor
manufacturing industry has raised the commercial stake in accurate EUV metrology.
The National Institute of Standards and Technology (NIST) has several programs
to serve the EUV user community, from the Synchrotron Ultraviolet Radiation
Facility (SURF!III) to measurement and calibration services for mirrors and
photodiodes. In this talk, I will describe the facilities and services available
in the Electron & Optical Physics Division at NIST and present results
of some recent research projects. The available facilities include several
beamlines at SURF III, a 400 MeV electron storage ring providing continuum
radiation from the soft x-rays to the infrared, a laser-produced-plasma source
of extreme UV radiation, and a normalincidence monochromator and calibration
system. I will discuss extreme UV radiometry, including the absolute detectors
at the head of the calibration chain and the transfer standard detector program,
and I will describe recent improvements to the radiometric scale in the extreme
UV. In addition to radiometric applications, I will describe our reflectometry
facilities and results from mirror lifetime testing. Other recent research
results include possible saturation mechanisms in Si photodiodes used to
measure highpeak-power pulsed radiation, characterization of wide-bandgap
detector materials such as GaN and SiC, end-to-end calibration of a rocket
instrument for solar EUV monitoring, and investigation of radiation damage
in Si photodiodes.